Dr. Slava Zhurin: Credentials & Experience
Education and Degrees
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Master of Science, Department of Physics, Moscow State University, Russia |
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Doctor of Philosophy in Physics and Mathematics, Institute of Chemical Physics, Russian Academy of Sciences |
Positions Before 1991
| Head of Laboratory, Institute of Mechanics of USSR Academy of Sciences |
| Head of Department, Computing Center of USSR Academy of Sciences |
| Head of Department, Institute of Oil and Gas Problems of USSR Academy of Sciences |
| Deputy Director Institute of Terrestrial Magnetism, Ionosphere and Radio Wave Propagation of USSR Academy of Sciences |
Professional Affiliations
| AIAA Technical Committee on Electrical Propulsion |
| International Shock Tube and Wave Society Member |
| International Committee on Numerical Methods in Fluid Dynamics |
Experience in Plasma Physics For Over 30 Years
Employment history:
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April 1996 to present Colorado Advanced Technology LLC |
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President and Plasma Physicist. Providing R&D services for ion/plasma sources: |
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Design and improvement of ion/plasma sources for low and high energies (10 eV 1000 eV) and ion beam currents (0.1-10 A) with working reactive and noble gases for industrial application; |
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Ion beam assisted deposition (IBAD) processes; |
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Biased target deposition (BTD); |
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End-Hall gridless ion sources (EHIS); |
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Closed-drift ion sources and thrusters (CDIS); |
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Magnetrons and ion sources at low and high pressures (10-5- 10 torr); |
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Matching ion/plasma sources with power supplies; suppressing instabilities and oscillations; |
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Specifics of operations with reactive gases; |
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Interaction of ion/plasma sources with targets, substrates and vacuum chamber. |
| June 2004 June 2005 Veeco Instruments, Fort Collins, CO |
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June 2005 - Present: Independent Consultant Gridless end-Hall cylindrical and linear sources, hollow cathodes; design and tests. |
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March 1991 March 2004 Kaufman & Robinson Inc., Fort
Collins, CO Gridless end-Halls, closed drift ion sources and thrusters, gridded ion sources, magnetrons, hollow cathodes, biased target deposition, ion beam assisted deposition; design and tests.
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