Patents Awarded and Applied
- US 6,323,586 – Closed Drift Hollow Cathode,
- US 6,238,537 – Ion Assisted Deposition Source,
- US 6,456,011 – Magnetic Field for Small Closed Drift Ion Source,
- US 6,454,910 – Ion Assisted Magnetron Deposition,
- US 6,882,634 – Apparatus for Sputter Deposition,
- US 6,750,600 – Hall-Current Ion Source,
- US 6,724,160 – Ion Source Neutralization with Hot Filament Cathode-Neutralizer,
- US 6,843,891 – Apparatus for Sputter Deposition,
- US 6,936,230 – System for Thermal and Catalytic Cracking of Crude Oil,
- US 2001/0045352 A1 – Sputter Deposition Using Multiple Targets,
- US 2005/0248284 A1 – Fluid-Cooled Ion Source,
- US 7,116,054 – High-Efficient Ion Source with Improved Magnetic Field,
- US11/405,719 - Hall-Current Ion Source for Ion Beams of Low and High Energy for Technological Applications,
- US 2003/0070984 A1 – Vortex Devices with Maximum Efficiency Nozzle,
- US 2005/0236043 A1 – Freeze-Free Water Hose (approved October 2006)
- US11/361,151 - Hygienic High Detergency Toilet.
