Technical Notes (publications available, please contact slava@ion-plasma.com, 970-225-2517)
PLASMA AND ION SOURCES FOR INDUSTRIAL APPLICATION
Different types
of ion sources with various magnetic field configurations are presented.
Application of broad beam ion sources for thin film technology is
discussed.
POWER SUPPLIES FOR ION SOURCES
A compatibility problem between a Power Supply and an Ion Source is presented.
CHARACTERIZATION OF LOW-FREQUENCY OSCILLATIONS IN HALL TYPE ION SOURCE WITH POWER SUPPLY
Different types
of oscillations taking place during operation of Hall type ion sources (end-Hall
and closed drift) and their role in stable undisturbed ion beam are presented.
DYNAMIC SIMULATORS FOR ION/PLASMA SOURCES
For a wide range of operations of ion source from 20-50 V to 1000 V it is necessary to provide Power Supplies that can sustain varieties of discharge voltage and current oscillations. Dynamic Simulators can provide Power Supplies with simulations of different operation conditions with oscillations and can help to select necessary parameters for Power Supplies.
ION SOURCE AND VACUUM CHAMBER
It is shown that an ion source and vacuum chamber represent a dynamic system with interactions between an ion source beam and a vacuum chamber walls. It is shown what is happened during such interaction. A role of negative ions in ion source’s “poisoning” effect is discussed.
NEXT GENERATION OF GRIDLESS ION SOURCES
It is presented
a view on the next generation of broad beam gridless ion sources, their
dimensions, operation characteristics, Power Supplies and what customers want.
HEAT TRANSFER AT LOW PRESSURES.
A Review of heat transfer in conditions of operation of ion sources. It is shown a role of radiation heat transfer and a negligible role of a contact and convective heat transfer in vacuum with long mean free path for particles
OPERATION OF ION SOURCES WITH REACTIVE GASES
A Review of operation of end-Hall ion sources with Oxygen and other reactive gases. A role of anode “poisoning” by oxides and what to do to avoid, or significantly decrease anode poisoning is presented.
OPERATION OF END-HALL ION SOURCE WITH OPTIMUM ELECTRON EMISSION
It is shown that for each operational condition with end-Hall ion sources it is necessary to find an optimum electron emission from a Hot Filament (HF), or a Hollow Cathode (HC), which is determined by a potential on a target, or a substrate.
LOW-ENERGY END-HALL ION SOURCE
It is shown what
kind of magnetic field would be optimum for obtaining low energy ion beams
(about 10-20 eV) and still to have substantial value of an ion beam current
(about 1 A and higher)
BIASED TARGET DEPOSITION
There is
presented a short Review of the physics of a low energy ion beam interaction
with a biased to high potential (up to 1000 V) target.
PULSED OPERATION OF END-HALL ION SOURCE.
It is shown that end-Hall ion sources can easily
operate in a pulsed regime with different working gases.
PLASMA LENS FOR HIGH-CURRENT ION BEAMS.
An invention
that is not patented yet can help to focus (to few mm diameter), or defocus (to
over 100 cm from a small 2 cm diameter ion source) ion beams of high ion beam
currents.
RADIATED POWER FROM ION SOURCE.
There is
presented an estimation of temperatures of an ion source’s discharge channel
and anode for typical Mark-2, or EH-1000 end-Hall ion sources.
STANDARDIZATION OF ION SOURCES.
A Review of existing instrumentation, ion sources and vacuum chambers for obtaining standard ion beam energies and ion beam currents for the same ion sources
