Technical Notes
1- "Optimum Operation of Hall-Current Ion Sources"
This article is about comparison of Closed
Drift and end-Hall Ion Sources, especially
about utilization of excessive electron emission
for obtaining operational parameters higher
than at regular Id ˜ Iem. This article shows how to get higher ion
beam current than at regular nominal
conditions. It also shows an end-Hall ion source dependence
of an ion beam current of a magnetic
field.
1-Zhurin_11-08_VTCarticle[1].pdf
2- "Oscillations and Instabilities in Hall-Current Ion Sources"
This article shows that Hall-current ion
sources have varieties of oscillations of discharge current and voltage. Some oscillations can transform into instabilities
that drastically change nominal operation with possible interruption. It is shown varieties of oscillations and what to do to mitigate
them.
2-Zhurin-VTC Oscillations_12-08_article[1].pdf
3- "Ion Source and Vacuum Chamber. Influence of Various Effects on Ion Beam Parameters"
This article shows that an ion source and
a vacuum chamber are actively interact during ion source operation. There are varieties of influencing factors
such as entrained working gas flow, charge exchange, presence of double ionized particles, insufficient pumping means, returned
to ion source sputtered particles, overheating of ion source parts, and many others that can disrupt regular nominal operation. It is shown how these factors must be taken
into account.
3-Ion Sources 3-09[2].pdf
4- "Industrial Gridless Broad Beam Ion Sources and The Need for Their Standardization. Part I. Closed Drift Ion Sources."
This article is about Closed Drift Ion Sources
(CDIS) that can be utilized in thin film technology. CDIS specific features are discussed.”
4-April-Zhurin_Ind_Sources_P1_4-09final[1].pdf
5- "Industrial Gridless Broad Beam Ion Sources and The Need for Their Standardization. Part II. End-Hall Ion Sources for Thin Film Technology."
This article is about various End-Hall Ion Sources (CDIS) that can be utilized in thin film technology. Various end-Hall ion sources specific features are discussed.”5-May-Zhurin Industrial Ion Sources Part2-05-19-09-[1].pdf
6- "Industrial Gridless Broad Beam Ion Sources and The Need for Their Standardization. Part 3A and 3B. Non-Traditional and Linear Broad Beam Ion Sources."
These articles are about various end-Hall
type ion sources that differ from established traditional ion sources. Linear Closed Drift, end-Hall type and arrays
of ion sources are discussed.
6-Part 3 A and B.pdf
7- "Industrial Gridless Broad Beam Ion Sources and The Need for Their Standardization. Part 4A. Hall-Current Ion Sources, Problems and Solutions."
This article is about the ion beam energy
distribution in Hall-current ion sources. These energy distributions, as it is shown, are too broad and in some specific tasks
can give problems in the ion assisted depositions.
7-Zhurin Part 4A.pdf
8- "Industrial Gridless Broad Beam Ion Sources and The Need for Their Standardization. Part 4B. Hall-Current Ion Sources, Problems and Solutions."
This article is about how to make various
end-Hall and other ion sources obey certain requirement to become standardized with similar
operating parameters becoming comparable to each other in the ion beam current and energy.
8-Zhurin Part4B 11-09 final-11-19-9-[1].pdf
9- "Cathods-Neutralizers For Ion Sources. Part 1. Introduction. Hot Filaments."
This article is about cathodes-neutralizers
and, in particular, this part is about the
most frequently utilized in practice of end-Hall
ion sources its Hot Filaments. We discuss the basics of ion beam neutralization
with traditional and unusual placements of
Hot Filaments. Advantages and shortcomings.
9-Zhurin-CathodesP1-1-10[1].pdf
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